Project Title: Transfer and implementation of Thermionic Vacuum Arc (TVA) coating technology for high hardness, low coefficient of friction and anti-corrosion
Exploratory project no. PN-IV-P7-7.1-PTE-2024-0792
Contract no.: 13PTE ⁄ 2025
Acronym: TITVA
Programme(s)

• PN IV – Program 5.7 – Partnership for Innovation

Project duration 24 MONTHS: 08/01/2025 – 31/12/2026.
Total cost: 1.752.500,00 lei
INOE: 250.000 lei
Partners:

• MGM STAR CONSTRUCT S.R.L. -Coordinator
• NATIONAL INSTITUTE FOR LASER, PLASMA AND RADIATION PHYSICS - INFLPR - Partner P1
• NATIONAL INSTITUTE OF RESEARCH AND DEVELOPMENT FOR OPTOELECTRONICS - INOE 2000- Partner P2

The main purpose of the project is the transfer and implementation of the coating technology developed by INFLPR (Thermionic Arc in Vacuum - TVA) to obtain films with high hardness, low friction coefficient and anti-corrosive films. The stages that will be completed for the purpose are: the concept, the design, the realization of the original layers deposition device, the preparation of the thin films with high hardness, low friction coefficient, or anticorrosive, the mechanical characteristics study of the deposited layers and the optimization of the deposition parameters depending on their application. Consequently, the main objective of this project proposal is the technological transfer and implementation of the TVA method, which is currently validated TRL 4, from INFLPR (P1) to the private company MGM Star S.R.L (CO) with the support of INOE 2000 (P2). Within this project, the coordinator will take the thermionic vacuum arc method from the stage of technology validated in laboratory conditions and together with the competencies of the two partners in the consortium will have at the end a demonstrated technology from the point of view of functionality in the industrial environment - TLR6. This technology will later be used by the project coordinator to deliver coating services to the industry to improve the used materials in terms of hardness, friction coefficient and corrosion resistance.